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Catalog Number:
36631
CAS Number:
7789-29-9
Potassium hydrogenfluoride solution, 3.0 M in H2O
Purity:
2.85 - 3.30 (Titration by NaOH)
Synonym(s):
Potassium acid bifluoride solution, Potassium acid fluoride solution
Hazmat
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$46.80 /25ML
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Product Information

Potassium hydrogenfluoride solution, 3.0 M in H2O, is a highly versatile compound widely utilized in various industrial and research applications. This solution is recognized for its strong fluoride ion concentration, making it an essential reagent in the synthesis of fluorinated compounds. Its ability to act as a fluoride source allows for effective etching of glass and ceramics, enhancing surface properties in semiconductor manufacturing and materials science. Additionally, it plays a crucial role in analytical chemistry, particularly in the determination of silicon and aluminum in various samples, providing accurate and reliable results.

Researchers and industry professionals benefit from the unique properties of potassium hydrogenfluoride solution, including its stability and ease of handling. Its concentrated formulation ensures efficient reactions, reducing the time and resources required for processes such as fluorination and mineral analysis. With its broad applicability, this compound is an invaluable tool for those looking to innovate in fields such as materials engineering, environmental analysis, and chemical synthesis.

Synonyms
Potassium acid bifluoride solution, Potassium acid fluoride solution
CAS Number
7789-29-9
Purity
2.85 - 3.30 (Titration by NaOH)
Molecular Formula
KHF2
Molecular Weight
78.1
MDL Number
MFCD00011403
Density
1.136
Appearance
Clear, colorless liquid
Conditions
Store at RT
General Information
Synonyms
Potassium acid bifluoride solution, Potassium acid fluoride solution
CAS Number
7789-29-9
Purity
2.85 - 3.30 (Titration by NaOH)
Molecular Formula
KHF2
Molecular Weight
78.1
MDL Number
MFCD00011403
Density
1.136
Appearance
Clear, colorless liquid
Conditions
Store at RT
Properties
Additional property information coming soon!
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Safety and Regulations
Hazmat
Yes
Antibiotic
No
DEA-regulated
No
Warnings
-
Applications

Potassium hydrogenfluoride solution, 3.0 M in H2O is widely utilized in research focused on:

  • Etching and Cleaning: This solution is commonly used in the semiconductor industry for etching silicon wafers and cleaning glassware, providing precise control over surface textures.
  • Fluorination Reactions: In organic chemistry, it serves as a fluorinating agent, allowing researchers to introduce fluorine atoms into organic compounds, which can enhance their biological activity.
  • Analytical Chemistry: It is employed in titrations and other analytical methods to determine the presence of certain metal ions, making it valuable for quality control in various industries.
  • Material Science: The solution is used in the development of fluorinated polymers, which exhibit unique properties such as chemical resistance and thermal stability, beneficial for coatings and insulation materials.
  • Environmental Applications: It plays a role in the treatment of hazardous waste, particularly in neutralizing fluoride-containing compounds, thereby aiding in environmental remediation efforts.

Citations