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Catalog Number:
35560
CAS Number:
13499-05-3
Hafnium(IV) chloride
Purity:
≥98% Metals basis excluding Zr (Zr : ≤ 2.7%)
Synonym(s):
Hafnium tetrachloride
Hazmat
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Product Information

Hafnium(IV) chloride is a versatile chemical compound with significant applications in various industries, particularly in the fields of materials science and electronics. This compound, also known as tetrachlorohafnium, is characterized by its high thermal stability and ability to form stable complexes, making it an ideal precursor for hafnium-based materials. Researchers and industry professionals utilize Hafnium(IV) chloride in the production of hafnium oxide, which is crucial for advanced semiconductor devices and high-k dielectrics in microelectronics. Its unique properties allow for the enhancement of performance in capacitors and transistors, paving the way for the development of next-generation electronic components.

In addition to its role in electronics, Hafnium(IV) chloride is also employed in the synthesis of various hafnium compounds, which are used in nuclear reactors due to their excellent neutron absorption capabilities. This makes Hafnium(IV) chloride an essential component in the production of materials that require high radiation resistance. The compound's ability to facilitate the growth of thin films further underscores its importance in the semiconductor industry, where precision and quality are paramount. With its diverse applications and benefits, Hafnium(IV) chloride stands out as a valuable resource for researchers and manufacturers alike.

Synonyms
Hafnium tetrachloride
CAS Number
13499-05-3
Purity
≥98% Metals basis excluding Zr (Zr : ≤ 2.7%)
Molecular Formula
HfCl4
Molecular Weight
320.3
MDL Number
MFCD00011034
PubChem ID
37715
Melting Point
432 ?C
Appearance
White powder
Conditions
Store at RT
General Information
Synonyms
Hafnium tetrachloride
CAS Number
13499-05-3
Purity
≥98% Metals basis excluding Zr (Zr : ≤ 2.7%)
Molecular Formula
HfCl4
Molecular Weight
320.3
MDL Number
MFCD00011034
PubChem ID
37715
Melting Point
432 ?C
Appearance
White powder
Conditions
Store at RT
Properties
Additional property information coming soon!
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Safety and Regulations
Hazmat
Yes
Antibiotic
No
DEA-regulated
No
Warnings
-
Applications

Hafnium(IV) chloride is widely utilized in research focused on various applications:

  • Semiconductor Manufacturing: It serves as a precursor in the production of hafnium oxide, a material critical for high-k dielectrics in advanced semiconductor devices, enhancing performance and efficiency.
  • Catalysis: This compound is used in catalytic processes, particularly in the production of specialty chemicals, where it helps improve reaction rates and selectivity.
  • Thin Film Deposition: Hafnium(IV) chloride is employed in chemical vapor deposition (CVD) to create thin films for optical coatings and microelectronics, providing superior durability and performance.
  • Nuclear Applications: It plays a role in the nuclear industry, particularly in the development of control rods and other components due to its high neutron absorption capabilities.
  • Research and Development: Researchers utilize this compound in various experimental setups to explore new materials and chemical reactions, contributing to advancements in materials science.

Citations