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Catalog Number:
35561
CAS Number:
13709-52-9
Fluorure d'hafnium (IV)
Purity:
≥99,9% Base métaux (Hf : 65 - 72%)
Synonym(s):
Tétrafluorure d'hafnium
Hazmat
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Product Information

Hafnium(IV) fluoride is a highly versatile compound known for its unique properties and applications in various industries. This inorganic fluoride exhibits excellent thermal stability and is a potent precursor for hafnium-based materials, making it invaluable in the production of advanced ceramics and semiconductor devices. Its ability to form stable complexes with other materials enhances its utility in the synthesis of hafnium oxide, which is crucial for high-k dielectric applications in microelectronics. Additionally, hafnium(IV) fluoride is utilized in the nuclear industry due to its neutron-absorbing capabilities, contributing to the safety and efficiency of nuclear reactors.

Researchers and industry professionals benefit from hafnium(IV) fluoride's unique characteristics, such as its high melting point and chemical inertness, which allow for its use in extreme environments. Its role in the development of cutting-edge technologies, including optical coatings and advanced materials for aerospace applications, underscores its significance. With its diverse applications and robust performance, hafnium(IV) fluoride stands out as a critical component in modern material science and engineering.

Synonyms
Tétrafluorure d'hafnium
CAS Number
13709-52-9
Purity
≥99,9% Base métaux (Hf : 65 - 72%)
Molecular Formula
HfF 4
Molecular Weight
254.48
MDL Number
MFCD00016127
PubChem ID
4092293
Appearance
Poudre blanche à blanc cassé
Conditions
Magasin chez RT
General Information
Synonyms
Tétrafluorure d'hafnium
CAS Number
13709-52-9
Purity
≥99,9% Base métaux (Hf : 65 - 72%)
Molecular Formula
HfF 4
Molecular Weight
254.48
MDL Number
MFCD00016127
PubChem ID
4092293
Appearance
Poudre blanche à blanc cassé
Conditions
Magasin chez RT
Properties
Additional property information coming soon!
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Safety and Regulations
Hazmat
Oui
Antibiotic
Non
DEA-regulated
Non
Warnings
-
Applications

Hafnium(IV) fluoride is widely utilized in research focused on:

  • Semiconductor Manufacturing: This compound is essential in the production of high-k dielectrics for advanced transistors, improving the performance and efficiency of electronic devices.
  • Nuclear Applications: Hafnium(IV) fluoride is used in nuclear reactors as a neutron absorber, helping to control the fission process and enhance safety.
  • Optical Coatings: It serves as a material for thin-film coatings in optical devices, providing superior durability and resistance to environmental factors compared to other fluoride compounds.
  • Catalysis: In chemical synthesis, this compound acts as a catalyst in various reactions, facilitating processes that require high temperatures and pressures.
  • Research in Material Science: Hafnium(IV) fluoride is studied for its unique properties in developing new materials with applications in aerospace and electronics, offering potential advantages in weight reduction and thermal resistance.

Citations