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Catalog Number:
35897
CAS Number:
7783-71-3
Fluoruro de tantalio (V)
Purity:
≥98% en
Synonym(s):
Pentafluoruro de tantalio
Hazmat
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Product Information

Tantalum(V) fluoride is a highly valuable compound known for its unique properties and applications in various high-tech industries. This inorganic fluoride exhibits excellent thermal stability and is a potent precursor for tantalum-based materials, making it essential in the production of advanced electronic components, such as capacitors and semiconductors. Its ability to form tantalum oxide films is particularly beneficial in the fabrication of thin films for microelectronics, enhancing device performance and reliability. Additionally, Tantalum(V) fluoride is utilized in the synthesis of tantalum metal and other tantalum compounds, which are critical in aerospace and medical applications due to their corrosion resistance and biocompatibility.

Researchers and industry professionals appreciate Tantalum(V) fluoride for its role in chemical vapor deposition (CVD) processes, where it contributes to the deposition of tantalum films with precise control over thickness and composition. Its unique properties allow for the development of high-performance materials that meet the demanding requirements of modern technology. With its diverse applications and advantages over similar compounds, Tantalum(V) fluoride stands out as a key material for innovation in electronics and materials science.

Synonyms
Pentafluoruro de tantalio
CAS Number
7783-71-3
Purity
≥98% en
Molecular Formula
TaF5
Molecular Weight
275.94
PubChem ID
82218
Melting Point
97 ?C
Density
4.74
Appearance
Polvo de color blanco a blanquecino
Boiling Point
230 ?C
Conditions
Tienda en RT
General Information
Synonyms
Pentafluoruro de tantalio
CAS Number
7783-71-3
Purity
≥98% en
Molecular Formula
TaF5
Molecular Weight
275.94
PubChem ID
82218
Melting Point
97 ?C
Density
4.74
Appearance
Polvo de color blanco a blanquecino
Boiling Point
230 ?C
Conditions
Tienda en RT
Properties
Additional property information coming soon!
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Safety and Regulations
Hazmat
Antibiotic
No
DEA-regulated
No
Warnings
-
Applications

Tantalum(V) fluoride is widely utilized in research focused on:

  • Semiconductor Manufacturing: This compound is used in the production of tantalum-based thin films, which are essential for the fabrication of high-performance semiconductor devices.
  • Optical Coatings: Tantalum(V) fluoride serves as a key material in creating anti-reflective coatings for lenses and optical components, enhancing their performance and durability.
  • Chemical Vapor Deposition (CVD): It is employed in CVD processes to deposit tantalum fluoride films, which are crucial in various electronic and photonic applications.
  • Research in Material Science: Researchers utilize this compound to study its properties and potential applications in advanced materials, including superconductors and high-capacity capacitors.
  • Fluorination Reactions: Tantalum(V) fluoride is used as a fluorinating agent in organic synthesis, enabling the introduction of fluorine into organic molecules, which can enhance their reactivity and stability.

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